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Residual stresses in (Zr,Hf)N films (up to 11.9 at.% Hf) measured by X-ray diffraction using experimentally calculated XECs

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dc.contributor.authorSARIOĞLU, CEVAT
dc.contributor.authorsAtar, E; Sarioglu, C; Cimenoglu, H; Kayali, ES
dc.date.accessioned2022-03-12T17:21:30Z
dc.date.available2022-03-12T17:21:30Z
dc.date.issued2005
dc.description.abstractIn the present work, the residual stresses of (Zr,Hf)N films were measured using X-ray diffraction (XRD) fixed incident multiplane technique (FIM) for varying amounts of Hf addition by assuming the film was isotropic and anisotropic (Kronel model). The residual stress values calculated according to isotropic and anisotropic models were almost the same (-6 GPa). Addition up to 11.9 at.% Hf into ZrN films did not affect the level of residual stress. (C) 2004 Elsevier B.V. All rights reserved.
dc.identifier.doi10.1016/j.surfcoat.2004.02.024
dc.identifier.issn0257-8972
dc.identifier.urihttps://hdl.handle.net/11424/228342
dc.identifier.wosWOS:000226188900007
dc.language.isoeng
dc.publisherELSEVIER SCIENCE SA
dc.relation.ispartofSURFACE & COATINGS TECHNOLOGY
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectthin film
dc.subjectX-ray diffraction
dc.subjectresidual stress
dc.subjectcoatings
dc.subjectZrN and HfN
dc.subjectZIRCONIUM NITRIDE COATINGS
dc.subjectHARD COATINGS
dc.subjectARC-EVAPORATION
dc.subjectTHIN-FILMS
dc.subjectDEPOSITED COATINGS
dc.subjectELASTIC-CONSTANTS
dc.subjectVACUUM-ARC
dc.subjectMULTICOMPONENT
dc.subjectTIN
dc.subjectPVD
dc.titleResidual stresses in (Zr,Hf)N films (up to 11.9 at.% Hf) measured by X-ray diffraction using experimentally calculated XECs
dc.typearticle
dspace.entity.typePublication
local.avesis.id0a31f665-92b0-48c9-81bc-ecce840997f9
local.import.packageSS17
local.indexed.atWOS
local.indexed.atSCOPUS
local.journal.numberofpages7
oaire.citation.endPage194
oaire.citation.issue2-3
oaire.citation.startPage188
oaire.citation.titleSURFACE & COATINGS TECHNOLOGY
oaire.citation.volume191
relation.isAuthorOfPublication6ec6d31d-4f25-485a-b1ea-0fe14f90a990
relation.isAuthorOfPublication.latestForDiscovery6ec6d31d-4f25-485a-b1ea-0fe14f90a990

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