Statistics for Comparison of trimethylgallium and triethylgallium as Ga source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition
Total visits
| views | |
|---|---|
| Comparison of trimethylgallium and triethylgallium as Ga source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition | 0 |
Total visits per month
| views | |
|---|---|
| May 2025 | 0 |
| June 2025 | 0 |
| July 2025 | 0 |
| August 2025 | 0 |
| September 2025 | 0 |
| October 2025 | 0 |
| November 2025 | 0 |
File Visits
| views | |
|---|---|
| Alevli et al. - 2016 - Comparison of trimethylgallium and triethylgallium.pdf | 19 |