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Effect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition: Effect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition

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dc.contributor.authorsAlevli, Mustafa; Gungor, Nese; Alkis, Sabri; Ozgit-Akgun, Cagla; Donmez, Inci; Okyay, Ali Kemal; Gamage, Sampath; Senevirathna, Indika; Dietz, Nikolaus; Biyikli, Necmi
dc.date.accessioned2022-03-02T05:48:00Z
dc.date.accessioned2026-01-10T16:51:05Z
dc.date.available2022-03-02T05:48:00Z
dc.date.issued2015-04
dc.identifier.doi10.1002/pssc.201400171
dc.identifier.issn18626351
dc.identifier.issue4-5
dc.identifier.pages423-429
dc.identifier.urihttps://hdl.handle.net/11424/218954
dc.identifier.volume12
dc.language.isoeng
dc.relation.urihttps://onlinelibrary.wiley.com/doi/10.1002/pssc.201400171
dc.titleEffect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition: Effect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition
dc.title.alternativeEffect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition
dc.typearticle
dspace.entity.typePublication

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