Publication:
High-transconductance silicon carbide nanowire-based field-effect transistor (SiC-NWFET) for high-temperature applications

dc.contributor.authorsMousa, Habeeb; Teker, Kasif
dc.date.accessioned2022-03-12T22:55:18Z
dc.date.accessioned2026-01-11T19:01:19Z
dc.date.available2022-03-12T22:55:18Z
dc.date.issued2021
dc.description.abstractPurpose The purpose of this study is to present a systematic investigation of the effect of high temperatures on transport characteristics of nitrogen-doped silicon carbide nanowire-based field-effect transistor (SiC-NWFET). The 3C-SiC nanowires can endure high-temperature environments due to their wide bandgap, high thermal conductivity and outstanding physical and chemical properties. Design/methodology/approach The metal-organic chemical vapor deposition process was used to synthesize in-situ nitrogen-doped SiC nanowires on SiO2/Si substrate. To fabricate the proposed SiC-NWFET device, the dielectrophoresis method was used to integrate the grown nanowires on the surface of pre-patterned electrodes onto the SiO2 layer on a highly doped Si substrate. The transport properties of the fabricated device were evaluated at various temperatures ranging from 25 degrees C to 350 degrees C. Findings The SiC-NWFET device demonstrated an increase in conductance (from 0.43 mS to 1.2 mS) after applying a temperature of 150 degrees C, and then a decrease in conductance (from 1.2 mS to 0.3 mS) with increasing the temperature to 350 degrees C. The increase in conductance can be attributed to the thermionic emission and tunneling mechanisms, while the decrease can be attributed to the phonon scattering. Additionally, the device revealed high electron and hole mobilities, as well as very low resistivity values at both room temperature and high temperatures. Originality/value High-temperature transport properties (above 300 degrees C) of 3C-SiC nanowires have not been reported yet. The SiC-NWFET demonstrates a high transconductance, high electron and hole mobilities, very low resistivity, as well as good stability at high temperatures. Therefore, this study could offer solutions not only for high-power but also for low-power circuit and sensing applications in high-temperature environments (similar to 350 degrees C).
dc.identifier.doi10.1108/MI-05-2021-0043
dc.identifier.eissn1758-812X
dc.identifier.issn1356-5362
dc.identifier.urihttps://hdl.handle.net/11424/236710
dc.identifier.wosWOS:000681499800001
dc.language.isoeng
dc.publisherEMERALD GROUP PUBLISHING LTD
dc.relation.ispartofMICROELECTRONICS INTERNATIONAL
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectHigh-temperature nanoelectronics
dc.subjecthigh transconductance
dc.subjectlow-power operation
dc.subjectSiC nanowire field-effect transistor (FET)
dc.subjectWide bandgap semiconductors (WBG)
dc.subjectELECTRICAL-TRANSPORT PROPERTIES
dc.subjectELECTRONICS
dc.subjectOPERATION
dc.subjectDIAMOND
dc.subjectDEVICES
dc.titleHigh-transconductance silicon carbide nanowire-based field-effect transistor (SiC-NWFET) for high-temperature applications
dc.typearticle
dspace.entity.typePublication
oaire.citation.endPage83
oaire.citation.issue2
oaire.citation.startPage78
oaire.citation.titleMICROELECTRONICS INTERNATIONAL
oaire.citation.volume38

Files